发明名称 SEMICONDUCTOR DEVICE
摘要 Provided is a semiconductor device including an interconnection structure provided on a cell region of a substrate to include a first line and a second line sequentially stacked on the substrate, and a defect detection structure provided on a peripheral region of the substrate to include first and second defect detection lines provided at the same levels as those of the first and second lines, respectively.
申请公布号 US2016233171(A1) 申请公布日期 2016.08.11
申请号 US201514985379 申请日期 2015.12.30
申请人 Samsung Electronics Co., Ltd. 发明人 KIM Sundae;CHO Yun-Rae;BAEK Namgyu;LEE Seokhyun
分类号 H01L23/544 主分类号 H01L23/544
代理机构 代理人
主权项 1. A semiconductor device, comprising: a substrate including a cell region and a peripheral region; an interconnection structure on the cell region to include a first line and a second line sequentially stacked on the substrate; and a defect detection structure on the peripheral region to include a first defect detection line and a second defect detection line provided at the same levels as those of the first and second lines, respectively.
地址 Suwon-si KR
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