发明名称 |
SEMICONDUCTOR DEVICE |
摘要 |
Provided is a semiconductor device including an interconnection structure provided on a cell region of a substrate to include a first line and a second line sequentially stacked on the substrate, and a defect detection structure provided on a peripheral region of the substrate to include first and second defect detection lines provided at the same levels as those of the first and second lines, respectively. |
申请公布号 |
US2016233171(A1) |
申请公布日期 |
2016.08.11 |
申请号 |
US201514985379 |
申请日期 |
2015.12.30 |
申请人 |
Samsung Electronics Co., Ltd. |
发明人 |
KIM Sundae;CHO Yun-Rae;BAEK Namgyu;LEE Seokhyun |
分类号 |
H01L23/544 |
主分类号 |
H01L23/544 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor device, comprising:
a substrate including a cell region and a peripheral region; an interconnection structure on the cell region to include a first line and a second line sequentially stacked on the substrate; and a defect detection structure on the peripheral region to include a first defect detection line and a second defect detection line provided at the same levels as those of the first and second lines, respectively. |
地址 |
Suwon-si KR |