SUBSTRATE PROCESSING APPARATUS, DEVICE MANUFACTURING METHOD, SCANNING EXPOSURE METHOD, EXPOSURE APPARATUS, DEVICE MANUFACTURING SYSTEM, AND DEVICE MANUFACTURING METHOD

摘要

The present invention is provided with the following: a first support member that supports either a mask or a substrate along a cylindrically curved first surface that has a given radius of curvature; a second support member that supports either the mask or the substrate, whichever is not supported by the first support member, along a given second surface; and a movement mechanism that rotates the first support member and moves the second support member so as to move the mask and the substrate in a scanning-exposure direction. Projection optics form an image of a pattern on a given image plane via a light beam that includes a principal light ray that is substantially parallel to a line perpendicular to the center of a projection region in the scanning-exposure direction. The movement mechanism sets the movement rate of the first support member and the movement rate of the second support member such that the support member for either the image plane onto which the pattern is projected or the substrate surface being exposed, specifically the one which is flat or has the higher radius of curvature, moves at a slower rate than the other support member.