发明名称 SURFACE POSITION DETECTION APPARATUS, EXPOSURE APPARATUS, AND EXPOSURE METHOD
摘要 A surface position detection apparatus capable of highly precisely detecting the surface position of a surface to be detected without substantially being affected by relative positional displacement due to a polarization component occurring in a light flux having passed through a reflective surface. In the apparatus, a projection system has a projection side prism member (7) having first reflective surfaces (7b, 7c), and a light receiving system has a light receiving prism member (8) having second reflective surfaces (8b, 8c) arranged in correspondence with the projection side prism member. The surface position detection apparatus further has a member for compensating relative positional displacement due to a polarization component of a light flux having passed through the first and second reflective surfaces.
申请公布号 HK1121229(A1) 申请公布日期 2016.09.15
申请号 HK20080108984 申请日期 2008.08.13
申请人 NIKON CORPORATION 发明人 HIDAKA, Yasuhiro;NAGAYAMA, Tadashi
分类号 G01B;G03F;H01L 主分类号 G01B
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