| 摘要 |
PURPOSE:To enable the expsure of electron beam in a high accuracy at a high speed in an electron beam exposure of step and repeat type by moving a stage at a high speed without using a counter of a laser interferometer during high speed moving. CONSTITUTION:In this electron beam exposure of step and repeat type, a switch S is opened during this high speed moving, and a stage moving system 17 is moved without using a counter of a laster interferometer. Then, the position mark of a specimen is scanned by a scanner 19 to detect a positioning mark, and when it is coincided with a target value of a data memory 18, the output applied to an amplifier 22 becomes 0. On the other hand, when a position mode detector 15 detects the approach of the stage to the target, a counter 12 will start, and the switch S is closed to convert the output of the counter into coordinate values by a converter 13 and to convert them via a D/A converter 14, and it is applied through an amplifier 22 to a deflector 3, and the vibration of the stage position is fed back to the electron beam. Then, a low speed movement is performed by a laser interferometer. |
