摘要 |
PURPOSE:To improve the reliability by forming a thin film having good drape with a wire layer by a low temperature heat treatment on a metallic wire layer formed on an oxidized film on a substrate, patterning it, treating it at high temperature and selectively removing the wire layer with the thin film as a mask. CONSTITUTION:A thin film 8 of Al2O3 is formed on an aluminum wire layer 3 formed on an oxidized film 2 on a substrate 1. The film 3 is selectively removed with a resist pattern 9 as a mask, the pattern 9 is removed, it is treated at high temperature, and the film 3 is selectively etched with the film 8 as a mask. Thus, the productions of the projection from the metallic wire layer and the residue of the resist can be prevented, thereby enhancing the reliability. |