USE OF AN OXYGEN-CONTAINING PLASMA TO DEVELOP A PHENOL-FORMALDEHYDE/DIAZOKETONE RESIST REACTED WITH MAGNESIUM IONS

摘要

Plasma Development of Resists Exposed patterns in phenol-formaldehyde Novolak resin/diazo ketone resist layers are developed in an oxygen plasma by treating the resist layers, prior to development, with a magnesium salt. This produces a negative pattern. Positive patterns are produced by combining the process with decarboxylation of the exposed areas followed by blanket exposure. FI9-79-063