| 发明名称 |
ULTRA-VIOLET LITHOGRAPHIC RESIST COMPOSITION INCLUDING A PHENOLIC-ALDEHYDE RESIN AND AS SENSITIZER A DERIVATIVE OF MELDRUM'S DIAZO |
| 摘要 |
<p>Phenolic-aldehyde resins sensitized with Meldrum's diazo or an analog thereof are useful as lithographic resists sensitive to deep ultra-violet light.</p> |
| 申请公布号 |
CA1132825(A) |
申请公布日期 |
1982.10.05 |
| 申请号 |
CA19800349767 |
申请日期 |
1980.04.14 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
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| 分类号 |
G03F7/016 |
主分类号 |
G03F7/016 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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