发明名称 |
INSPECTING DEVICE OF PATTERN |
摘要 |
<p>PURPOSE:To enable the inspection of a pattern in high reliability by detecting the displacement of the detecting pattern due to a CCD with respect to the pattern produced by a bit pattern generator (BPG) and providing a correction mechanism for correcting the displacement. CONSTITUTION:A basic pattern 6 formed by a BPG and a pattern1 to be detected by a CCD are detected by a detecting picture element 7. When the position becoming the same pattern edge is, for example, disposed at the basic pattern 6 of the BPG to detect NA and at the pattern 6 to detect NB, a correction mechanism 8 which moves the CCD to correct the difference DELTAS between the NA and the NB and to set the difference DELTAS to zero is provided. That is, a rockable box 10 is moved from the support 14 via a roller 21 and an adjustment screw 15. The position of X-Y directions of the CCD can be corrected by providing the two mechanism 22.</p> |
申请公布号 |
JPS57159023(A) |
申请公布日期 |
1982.10.01 |
申请号 |
JP19810044040 |
申请日期 |
1981.03.27 |
申请人 |
HITACHI SEISAKUSHO KK;HITACHI OUME DENSHI KK |
发明人 |
KAWASHIMA HIDEAKI;NAKAGAWA KIYOSHI;SHIMIZU KUNIO |
分类号 |
G01N21/88;G01N21/93;G01N21/956;G03F1/84;H01L21/027;H01L21/30;H01L21/66 |
主分类号 |
G01N21/88 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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