发明名称 INSPECTING DEVICE OF PATTERN
摘要 <p>PURPOSE:To enable the inspection of a pattern in high reliability by detecting the displacement of the detecting pattern due to a CCD with respect to the pattern produced by a bit pattern generator (BPG) and providing a correction mechanism for correcting the displacement. CONSTITUTION:A basic pattern 6 formed by a BPG and a pattern1 to be detected by a CCD are detected by a detecting picture element 7. When the position becoming the same pattern edge is, for example, disposed at the basic pattern 6 of the BPG to detect NA and at the pattern 6 to detect NB, a correction mechanism 8 which moves the CCD to correct the difference DELTAS between the NA and the NB and to set the difference DELTAS to zero is provided. That is, a rockable box 10 is moved from the support 14 via a roller 21 and an adjustment screw 15. The position of X-Y directions of the CCD can be corrected by providing the two mechanism 22.</p>
申请公布号 JPS57159023(A) 申请公布日期 1982.10.01
申请号 JP19810044040 申请日期 1981.03.27
申请人 HITACHI SEISAKUSHO KK;HITACHI OUME DENSHI KK 发明人 KAWASHIMA HIDEAKI;NAKAGAWA KIYOSHI;SHIMIZU KUNIO
分类号 G01N21/88;G01N21/93;G01N21/956;G03F1/84;H01L21/027;H01L21/30;H01L21/66 主分类号 G01N21/88
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