发明名称 STRUCTURE OF EVAPORATING SOURCE FOR CONTINUOUS VACUUM DEPOSITION
摘要 PURPOSE:To improve the yield of plating materials and operation time by contg. a specific sealing material in an evaporating source vessel in a molten state, and forming a plating material liquid layer on the liquid surface of the sealing material in the space formed of a cover and the sealing material. CONSTITUTION:For example, Pb which is sealing metal and Zn which is plating metal are contained in an evaporating source vessel 4, and are heated and held to and at the temp. in the stage of vacuum deposition of Zn. This creates the state wherein the alloy liquid phase 27 consisting essentially of Zn exists on the alloy liquid phase 20 consisting essentially of Pb. Zn vapor particles scatter like arrows 10, 11 from the liquid surface 8 of the liquid phase 27, and arrive directly at the lower surface 14 of a steel strip 13 and condense there, thus forming a palating layer. In this case, the leading end part of a cover 25 is immersed in the liquid phases 20, 27 and therefore the temp. of the cover 25 is high and the vapor particles do not condense on the wall surface and rather reevaporate, thereby forming no deposits. This vessel 4 permits extremely less leakage of the Zn vapor particles to the outside, and since it does not form a large amt. of deposits, the long-term continuous operation is made possible.
申请公布号 JPS57158379(A) 申请公布日期 1982.09.30
申请号 JP19810041794 申请日期 1981.03.24
申请人 MITSUBISHI JUKOGYO KK 发明人 NAKAGAWA YOSHIKIYO
分类号 C23C14/24 主分类号 C23C14/24
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