| 摘要 |
PURPOSE:To produce a rugged substrate having a pattern different that of a shadow mask, by giving aperture patterns having regular pitches of 5-20mu in the vertical direction to the shadow mask and exposing the shadow mask while keeping the interval between a photoresist and the shadow mask in a specific range. CONSTITUTION:A shadow mask 3 which has checkers consisting of square parts (black), through which the light is not transmitted, with one side 2.5-10mu long and light transmitting square parts (white) with one side 2.5-10mu long and has a pattern where aperture pitches are 5-20mu in the vertical direction is held on a negative photoresist 2 on a substrate 1 through a gap 4, 5-80mu long, and they are exposed from the side of the mask 3. Next, they are developed, and the resist 2 in an unexposed part is removed, and the substrate is etched, thus obtaining a rugged substrate having a square height surrounded by white grooves. When a positive photoresist is used, a rugged substrate having a hollow surrounded by banks is obtained. A phosphor or the like can be grown in the hollow. |
