发明名称 Anti-contamination diaphragm for an electron beam apparatus
摘要 In order to reduce object contamination during the examination or machining of the object in an electron beam apparatus, an anti-contamination diaphragm is provided in place of the customary diaphragm. The anti-contamination diaphragm has a central aperture which corresponds to a customary diaphragm aperture, and a concentric annular aperture for transmitting a non-paraxial hollow beam which irradiates a ring around the paraxial focus on the object. The conical hollow anti-contamination beam forms a barrier against contaminating residual gas molecules, notably hydrocarbon molecules.
申请公布号 US4352015(A) 申请公布日期 1982.09.28
申请号 US19800180712 申请日期 1980.08.25
申请人 U.S. PHILIPS CORPORATION 发明人 JORE, ALFRED;VAN GORKOM, GERARDUS G. P.;DEKKERS, NICOLAAS H.
分类号 H01J37/20;H01J37/09;H01L21/027;(IPC1-7):G01N23/00 主分类号 H01J37/20
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