发明名称 |
Anti-contamination diaphragm for an electron beam apparatus |
摘要 |
In order to reduce object contamination during the examination or machining of the object in an electron beam apparatus, an anti-contamination diaphragm is provided in place of the customary diaphragm. The anti-contamination diaphragm has a central aperture which corresponds to a customary diaphragm aperture, and a concentric annular aperture for transmitting a non-paraxial hollow beam which irradiates a ring around the paraxial focus on the object. The conical hollow anti-contamination beam forms a barrier against contaminating residual gas molecules, notably hydrocarbon molecules.
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申请公布号 |
US4352015(A) |
申请公布日期 |
1982.09.28 |
申请号 |
US19800180712 |
申请日期 |
1980.08.25 |
申请人 |
U.S. PHILIPS CORPORATION |
发明人 |
JORE, ALFRED;VAN GORKOM, GERARDUS G. P.;DEKKERS, NICOLAAS H. |
分类号 |
H01J37/20;H01J37/09;H01L21/027;(IPC1-7):G01N23/00 |
主分类号 |
H01J37/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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