Apparatus for regulating substrate temperature in a continuous plasma deposition process.

摘要

Apparatus for raising a continuous substrate to a predetermined deposition temperature and thereafter maintaining it at that temperature as it advances through a glow discharge chamber. A lamp holder having a plurality of heater lamps extends substantially the length of the chamber. The lamps are selectively spaced apart along the length of travel of said substrate to provide a desired heating profile. A detector is engaged to control circuitry for continuously adjusting the intensity of the lamps to regulate substrate temperature.