| 摘要 |
Relatively monochromatic soft X-rays at 4.5 m mu is used to induce auger electrons from the silver-halide crystal to sensitize the photosensitive grain, and the exposed crystal is developed into a fine silver grain. The pattern of the silver grains with sizes of about 0.02 mu can be used as a photoresist with a resolution of about 0.1 mu . The silver grains can also be used to initiate certain organic compounds for the resist, also with a resolution of the order of 0.1 mu .
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