| 摘要 |
PURPOSE:To achieve a stable blanking performance in an electron beam drawing device by reducing charge-up of a blanking plate to contamination. CONSTITUTION:A repeller electrode is provided. With application of a repelling voltage on this electrode, attack of relfected electrons and secondary electrons on a means for deflecting electron beams is prevented. For example, a repeller electrode 13 is installed between a blanking diaphragm 5 and a blanking plate 4, and a repelling voltage from a repelling voltage controller 12 is applied between the repeller 13 (minus) and the blanking diaphragm 5 (earth). Repelled electrons 2 and secondary electrons 11 emitted from outside the opening of diaphragm 5 are repelled by repeller electrode 13, not attacking contamination of the blanking plate 4. Thus, charge-up in the plate surface is degraded. |
