发明名称 POSITIVE TYPE RESIST POLYMER COMPOSITION AND METHOD OF MAKING RESIST PATTERNS
摘要 PCT No. PCT/JP78/00021 Sec. 371 Date July 2, 1979 Sec. 102(e) Date July 7, 1979 PCT Filed Nov. 6, 1978 PCT Pub. No. WO79/00283 PCT Pub. Date May 31, 1979 A cross-linkable positive-working ionizing radiation-resist or ultraviolet ray-resist polymer composition comprising, in polymerized form, (a) from about 70 to about 99% by mole of units derived from a methacrylic acid ester of the formula: CH2=C(CH3). COOR where R is an alkyl or haloalkyl group having from 1 to 6 carbon atoms, a benzyl group or a cyclohexyl group, (b) from about 1 to about 20% by mole of units derived from methacrylamide, and (c) from about 0.05 to about 20% by mole of units derived from methacrylic acid chloride; each amount of the units (a), (b) and (c) being based on the total moles of the units (a), (b) and (c). The polymer composition is preferably in the form of either a copolymer comprised of the units (a), (b) and (c), or a blend of a copolymer comprised of the units (b) and a portion of the units (a) and a copolymer comprised of the units (c) and the remainder of the units (a). The resist polymer composition exhibits enhanced sensitivity as well as good thermal resistance, contrast and resolution.
申请公布号 DE2861975(D1) 申请公布日期 1982.09.16
申请号 DE19782861975 申请日期 1978.11.06
申请人 FUJITSU LIMITED 发明人 YONEDA, YASUHIRO;KITAKOHJI, TOSHISUKE;KITAMURA, KENRO
分类号 C08F220/00;C08F20/52;C08F220/04;C08F220/10;G03F7/039;H01L21/027;(IPC1-7):G03C1/72;G03F7/02;H01L21/30 主分类号 C08F220/00
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