发明名称 |
Laser enhanced maskless method for plating and simultaneous plating and etching of patterns |
摘要 |
A method for high resolution maskless plating with an immersion, exchange or like plating bath is described. Preferential plating results from exposing those regions where plating is sought to an energy beam to increase the plating rate and the resulting plating thickness is several orders of magnitude greater than is possible by standard immersion techniques. |
申请公布号 |
US4349583(A) |
申请公布日期 |
1982.09.14 |
申请号 |
US19810287661 |
申请日期 |
1981.07.28 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
KULYNYCH, LARYSA H.;ROMANKIW, LUBOMYR T.;VON GUTFELD, ROBERT J. |
分类号 |
C25D5/02;H05K3/22;(IPC1-7):B05D3/06 |
主分类号 |
C25D5/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|