| 摘要 |
An exposure control mechanism for use with chemical flash illumination includes a shutter having a primary shutter blade mounted for pivotal movement between a rest position wherein the shutter blade covers an exposure aperture, through an intermediate position wherein the shutter blade uncovers the exposure aperture, and a rebound position. A spring urges the shutter blade toward the rest position. A shutter driver drives the primary shutter blade from the rest position to the rebound position, and a flash firing mechanism synchronized with the shutter driver ignites a chemical flashlamp substantially simultaneously with the start of movement of the primary shutter blade. An auxiliary shutter blade operatively coupled to the primary shutter blade, covers the exposure aperture during movement of the primary shutter blade through its intermediate position on its way from its rest position to its rebound position, and uncovers the exposure aperture during movement of the primary shutter blade through its intermediate position on its way from its rebound position to its rest position, thereby effecting an exposure after an initial delay.
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