| 摘要 |
PURPOSE:To obtain a target for sputtering wherein a thin film having high quality and high reliability can be formed at low cost with a simple constitution by providing a target main body having metal or nonmetal as an essential component and furthermore providing a plurality of ring-like structural materials having same component as the above-mentioned component to the target main body. CONSTITUTION:A metallic target 2, for example made of Te is bonded on a backing plate 1 made of copper or stainless steel with a bonding layer 3 consisting of alloy chiefly made of In. In such a metallic target 4, a plurality of ring-like structural materials which consist of metal different from Te i.e. consist of single substance of Pd, namely multiple rings A (5a), B (5b) are buried so that these are made coaxial with the center of the metallic target main body 2. By this target for sputtering, the film composition of a thin alloy film is uniformly formed on a base plate with a simple constitution and also the film having high quality and high reliability can be formed. |
