| 摘要 |
PURPOSE:To enhance ultraviolet photosensitivity of a resist, and sharpness and adhesion of a pattern film, by adding a water-soluble bisazide compound and a diazo compound as a cross-linking agent to a water-soluble polymer material. CONSTITUTION:A water-soluble bisazide compound and a water-soluble diazo compound are both used for a water-soluble polymer material as a cross-linking agent to solve both problems: the problem of an azide type photoresist, adhesion, and that of a diazo type photoresist, photosensitivity and heat stability of a photosensitive liquid. The high sensitivity to ultraviolet rays that has never been obtained in the case of using a single cross-linking agent can be obtained by the synergistic effect of said agents, thus permitting the obtained water-soluble photoresist to be high in ultraviolet sensitivity and a pattern film formed to have sharpness and strong adhesion. |
