发明名称 VAPOR-DEPOSITING METHOD
摘要 PURPOSE:To measure accurately the temperature on an evaporating surface and to realize the control of the evaporating speed with high precision, by keeping the position of the vapor-depositing surface of a fused vapor-depositing material at a constant level for vapor deposition. CONSTITUTION:A vapor-depositing board 1 is set to support stands 2 and 3, and a cover 5 of a storing room 8 to charge a vapor depositing material. Then a heater such as of resistance heating type is set to a groove 10 of the stand 2. At the same time, the material to be vapor-deposited is cooled at the part of the cover 5 by means of a water-cooling pipe 6 to suppress the vapor pressure of the vapor-depositing material. Vacuum evaculation is carried out, and then the heater is heated. Thus the board 1 is heated, and the charged vapor-depositing material is melted to be evaporated through a slit 7 of an evaporating room 9. Thus the vapor-depositing material can be supplied to the board 1 without changing the position of the evaporating surface. The evaporating speed at this moment is decided by the temperature of the evaporating surface. Therefore a thermocouple 4 is fixed to near the evaporating surface, and the heater current is controlled to set the temperature at a prescribed level at the area near the evaporating surface. In such a way, a certain evaporating speed can be obtained with good reproducibility.
申请公布号 JPS57145973(A) 申请公布日期 1982.09.09
申请号 JP19810031884 申请日期 1981.03.05
申请人 CANON KK 发明人 OOSATO YOUICHI;MISUMI TERUO
分类号 C23C14/24;C23C14/26;C23C14/54 主分类号 C23C14/24
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