| 摘要 |
PURPOSE:To increase the washing effect for a semiconductor surface and at the same time to realize the labor saving, by holding a cushion part between the 1st fixing plates, winding a washing tool to cover the cushion part and holding the washing tool with the 2nd fixing plate. CONSTITUTION:A parts 1 of sponge, etc. is produced by a nonmetal and then held between the 1st fixing plates 2. These parts 1 and the plates 2 are wound with a washing tool 3 of cloth, sponge, etc. and fastened by the 2nd fixing plates at both sides. Such structure is attached to a mask washing device, and the mask surface is rubbed with the tool 3 for washing. As a cusion part 1 absorbs the rubbing force to prevent the positional shift of the tool 3. Thus a sufficient effect of washing is obtained. |
