发明名称 PROCESS FOR ELECTRODIALYTICALLY REGENERATING AN ELECTROLESS PLATING BATH BY REMOVING AT LEAST A PORTION OF THE REACTED PRODUCTS
摘要 <p>A process is provided for regenerating a spent electrode copper plating bath which contains alkli metal salts resulting from the reduction of a water soluble copper salt under copper plating and reducing conditions. The regeneration is effected by means of the electrodialytic transfer of at least a portion of the anions in the spent plating bath through an anionic permselective membrane into the anode compartment of an electrodialytic cell. In the perferred embodiment, hydroxyl ions from the cathode compartment of the electrodialytic cell are concurrently transferred through a second anionic permselective membrane to replace the transferred anions, the replacment taking place in a compartment of the electrodialytic cell located between the two anionic permselective membrane.</p>
申请公布号 CA1131165(A) 申请公布日期 1982.09.07
申请号 CA19800346933 申请日期 1980.03.04
申请人 ELECTROCHEM INTERNATIONAL, INC. 发明人 GRENDA, DAVID W.
分类号 B01D61/44;C23C18/16;C25B15/08;(IPC1-7):25B15/08 主分类号 B01D61/44
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