发明名称 MOUNTING METHOD OF IC
摘要 PURPOSE:To increase productive yield, by tin-plating an IC jointing finger only, after gold-plating the whole surface of an overall pattern of a circuit substrate. CONSTITUTION:An Au layer 5 is plated on the pattern surface formed by a copper foil 4 on a circuit substrate 1. An Sn layer 6 is plated thereon. While an Au bump 7 is formed on each jointing electrode of an IC3, a finger 4a is pressurized by heat with it. The Sn layer 6 of the finger 4a is diffused in the Au bump 7 of the IC3. This results in the formation of Au-Sn eutectic alloy and the strong bonding. As the Au layer is formed on the surface of a jointing electrofe 4b for the circuit substrate 1, the jointing conditions among indicating elements can be kept better.
申请公布号 JPS57143835(A) 申请公布日期 1982.09.06
申请号 JP19810028165 申请日期 1981.02.27
申请人 CITIZEN TOKEI KK 发明人 SHIMADA YOSHIHIRO
分类号 H05K3/34;H01L21/60;H01L21/603 主分类号 H05K3/34
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