发明名称 OPTICAL ALIGNING SYSTEM FOR TWO PATTERNS AND PHOTOREPEATER MAKING USE OF SUCH A SYSTEM
摘要 An optical system for aligning two patterns particularly by photo-repetition in which a first pattern formed by two optical networks, disposed along two coordinate axes is illuminated by the image of a second pattern comprising two optical networks, forming a reference produced from the orders of diffraction. In a variation, the optical networks are formed from a series of parallel strokes whose thickness and spatial distribution in a first direction parallel to one of the coordinate axes are determined by a pseudo-random code; the strokes of the optical networks of the first pattern being furthermore interrupted periodically in a second direction orthogonal to the first direction so as to form an optical network with a constant pitch in this direction. The optical alignment system comprises means for detecting the intensity of a predetermined part of the orders of diffraction in the second direction.
申请公布号 DE3060657(D1) 申请公布日期 1982.09.02
申请号 DE19803060657 申请日期 1980.01.23
申请人 THOMSON-CSF 发明人 LACOMBAT, MICHEL;DUBROEUCQ, GEORGES
分类号 H01L21/30;G01B11/00;G02B27/42;G03F9/00;H01L21/027;(IPC1-7):G03B41/00;G05D3/00 主分类号 H01L21/30
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