METHOD OF GROWING PLASMA OXIDE ON SEMICONDUCTOR SUBSTRATES AND DEVICE FOR CARRYING OUT THIS METHOD,申请号EP19800100325-传众专利搜索

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发明名称	METHOD OF GROWING PLASMA OXIDE ON SEMICONDUCTOR SUBSTRATES AND DEVICE FOR CARRYING OUT THIS METHOD
摘要
申请公布号	EP0016909(B1)	申请公布日期	1982.09.01
申请号	EP19800100325	申请日期	1980.01.23
申请人	INTERNATIONAL BUSINESS MACHINES CORPORATION	发明人	RAY, ASIT KUMAR;REISMAN, ARNOLD
分类号	H01L21/31;C23C8/36;H01L21/316;(IPC1-7):01L21/316;01J37/32	主分类号	H01L21/31
代理机构		代理人
主权项
地址

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