| 摘要 |
<p>PURPOSE:To obtain an aligner which has few demerit and is used for both large and small aperture substrates, by exchanging positioning relations of the substrate to X and Y stages in the middle of one substrate's exposure and performing exposure on a plurality of regions divided in the substrate, and otherwise. CONSTITUTION:This device has a substrate exchanging means HC and a controlling means for division repetitive exposures. In the substrate exchanging means HC, mutual positioning relations of a substrate W to X and Y stages WX and WY are exchanged. In the controlling means for division repetitive exposures, while X and Y stages are carried, a series of repetitive exposures for original plate R's images projected by a projection lens PO are performed on a partial region of the substrate W, and the said mutual positioning relations are ex changed, and a series of repetitive exposures for a part or the whole of unexposed regions are performed in required numbers. Further, this exposure device has the following instrumenta tion. correction means: after exposure on one region, the mutual positioning relations of the substrate W to the X and Y stages are exchanged, and next a positioning relation between an exposure regional latent image alignment mark on a substrate W and a reference mark on the original plate R, and the positions of stages are read out and identified with a fixed layout by the correction of rotary components and XY components.</p> |
