| 摘要 |
PURPOSE:To obtain a new method of forming a high sensitivity pattern without detrimental liquid waste by combining a patterning of silver halide film by the exposure of an electron beam and a patterning of metal by electroless plating. CONSTITUTION:This method has the steps of forming a silver halide film on a substrate, exposing it with an electron beam, X-ray or ion beam to form a pattern of silver particles, and forming a metallic film by electroless plating. High resolution silver halide emulsion is coated on a glass substrate 1 to form a silver halide layer 2, a pattern is drawn by an electron beam drawing device, is then developed and fixed to form a silver particle pattern. Then, the substrate is dipped in an electroless nickel plating bath to form a nickel film 4, and is then cleaned and baked, thereby obtaining a desired mask. |
