| 摘要 |
PURPOSE:To automate positioning and improve its accuracy by detecting a scribing line or the positioning mark of the whole and successively moving and controlling the inspecting position of a photo-mask on the basis of the size, etc. of each unit pattern while using the position of said line or mark as the reference. CONSTITUTION:Each unit pattern P on the photo-mask 1 is read photoelectrically, and compared with pattern forming data memorized, and acceptables or defectives are inspected and displayed. The pattern with the scribing lines 2A, 2B is positioned in such a manner that a table is driven from an arbitrary initial location 0, the line edges S1-S4 of the pattern P1 are detected, and the central position C is calculated from each moving distance l1-l4, and used as the reference point of positioning. The photo-mask is moved in the X or Y direction only by a predetermined distance including line width after the P1 is inspected, and the P such as the P2 is positioned. The mask with no scribing line is positioned in such a manner that one of marks M put at both left and right ends is detected as a reference point, and the mask is successively shifted and controlled in the X or Y direction at every the size d of a unit pattern region from the reference point. Accordingly, the inspection of the mask with no physical mark can also be automated and can be executed with high accuracy. |
