发明名称 VAPOR SOURCE FOR VACUUM VAPOR DEPOSITION
摘要 PURPOSE:To prevent splashes and to form vapor deposition films of good quality by providing a shielding plate in the upper part of a melt well of a vapor source by a resistance heating system, and further providing tapered parts worked to rough surfaces around the melt well as evaporating parts for the vapor depositing material. CONSTITUTION:A melt well 12 is formed in the central part of a flat plate 11 consisting of W, and the surfaces of the tapered parts 13 around the well 12 are roughened by machining or chemical treatment to have improved wettability to vapor depositing material. The top edges of the side faces of the well 12 of the plate 11 are rails, on which a shielding plate 15 is mounted freely slidably and is so disposed as to cover the upper part of the well 12. The plate 15 is kept heated through conduction of electricity or the like. The splashes 18 which boil and scatter when the melt 17 in the well 12 is evaporated by heating the plate 11 through conduction of electricity from an electrode 16 are trapped by the plate 15, whilist the vapor depositing material derived to the tapered parts 13 evaporate, thereby forming vapor deposition films.
申请公布号 JPS57137468(A) 申请公布日期 1982.08.25
申请号 JP19810023862 申请日期 1981.02.20
申请人 TOKYO SHIBAURA DENKI KK 发明人 KURIHARA YOSHIHISA
分类号 C23C14/26;C23C14/24;H01L21/285 主分类号 C23C14/26
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