| 摘要 |
PURPOSE:To facilitate work, and to enable the application to the mask of a minute pattern and rewashing by forming the surface of a glass substrate in a white pin hole to the surface, which refracts and reflection-diffuses incident beams, through working by a glass substrate etching liquid. CONSTITUTION:The photo-mask 11 with a white pin hole defective section 14 to incident beams 16 generated on the transparent glass substrate 12 is prepared, and the white pin hole defective section 14 of the photo-mask is contacted with the glass substrate etching liquid, thus forming the surface of the glass substrate of the defective section to a dull surface 15, on which the incident beams are refracted 18 or reflection-diffused 17, through working. Accordingly, correctiong work is made easy and accurate, and application to the mask with the minute pattern and rewashing are enabled. |
