<p>Adams-4 11 RADIATION MASK STRUCTURE The discovery that boron nitride and boron carbide films can be made in tension allows nondistorting radiation windows or masks to be realized. Both low and high pressure techniques for making the tensile films lead to related mask structures utilizing such films. The resulting structures are sufficiently distortion free to be useful for x-ray lithography.</p>
申请公布号
CA1129635(A)
申请公布日期
1982.08.17
申请号
CA19790335415
申请日期
1979.09.11
申请人
WESTERN ELECTRIC COMPANY, INCORPORATED
发明人
ADAMS, ARTHUR C.;CAPIO, CESAR D.;LEVINSTEIN, HYMAN J.;SINHA, ASHOK K.;WANG, DAVID N.