| 摘要 |
<p>A device for processing optical information is provided comprising a system of optical elements (6, 7, 9, 10, 12, 13) arranged along an optical main axis (11) for guiding a light beam (4) to a radiation-sensitive detection system (8), in which at least one coma correction plate (13, 20, 21) is provided comprising a substrate having a dielectric layer varying in thickness such that the differences in path length in the light beam which are formed by coma in the system of optical elements are at least partly compensated for. …<??>A method of manufacturing such a coma correction plate is provided in which, during vapour deposition of the dielectric layer in a vapour deposition device, a plate-shaped substrate (32) is moved at a constant speed below a template (33) parallel to an axis (34) which is situated in the plane of the template, which template (33) is situated between the vapour deposition source (30) and the substrate (32) and has an aperture (35), which aperture lies across axis (34) and has an edge (36) whose profile on either side of the axis varies as a third power function of the distance to the axis, the point of intersection (37) of the axis with the part of this edge being taken as zero point.</p> |
