发明名称 Process for producing thin films, target for carrying out said process and process for producing said target
摘要 In view of the problem of producing thin films, for example ferroelectrics, in the desired material composition in a simple manner, it is proposed to produce a target in accordance with the drawing not made of metal oxides but of the metals themselves in a simple manner and to oxidise the metals during sputtering of the target so that reproducible, stoichiometrically correct thin films are produced without the exceptional use of aids. <IMAGE>
申请公布号 DE3103509(A1) 申请公布日期 1982.08.12
申请号 DE19813103509 申请日期 1981.02.03
申请人 KLEER,GUENTER,DIPL.-PHYS.;SCHMITT,HEINZ,DR.RER.NAT.;MUESER,HORST EGON,PROF.DR. 发明人 KLEER,GUENTER,DIPL.-PHYS.;SCHMITT,HEINZ,DR.RER.NAT.;EGON,PROF.DR. MUESER,HORST
分类号 C23C14/00;C23C14/34;(IPC1-7):C23C15/00 主分类号 C23C14/00
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