发明名称 PATTERN INSPECTING APPARATUS
摘要 PURPOSE:To enable a positioning in pattern inspection automatically and at a high accuracy by shifting a position of a movable detecting section in response to a calculation output on the basis of a signal from the fixed and movable detecting section. CONSTITUTION:A fixed detecting section 16 is set roughly over a predetermined unit pattern P3 for a photo mask 10 mounted on X-Y table 11 and the unit pattern P3 is compared with a reference pattern signal 22. Subsequently, the table 16 is shifted so that the pattern P3 is set at a predetermined position for the detection part 16. Subsequently, after a movable detecting section 17 is set roughly over a unit patter P4 to be compared, a pattern signal for the detecting sections 17, 16 is compared with the other. In this case, if there exists a displacement between the pattern signals, an operation decision circuit 21 is operated to actuate a motor 18 through a control circuit 24 and perform a positioning for the pattern P4 through a feedback control of the detecting section 17, 16. Therefore, after the positioning for the detecting sections 17, 16 has been completed, the circuit 21 performs a detailed comparison between the shapes of the patterns P3 and P4 to decide the acceptability concerning the quality of the patterns 4, 3.
申请公布号 JPS57130424(A) 申请公布日期 1982.08.12
申请号 JP19810015737 申请日期 1981.02.06
申请人 HITACHI SEISAKUSHO KK 发明人 NAKAGAWA KIYOSHI;KAWASHIMA HIDEAKI
分类号 G01N21/88;G01N21/93;G01N21/956;G03F1/00;G03F1/84;H01L21/027;H01L21/30;H01L21/66 主分类号 G01N21/88
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