| 摘要 |
PURPOSE:To simplify the process, by placing a substrate in a monomer solution of photopolymerization and polymerizing through replacement with a monomer having low refractive index after polymerized growing while mask exposure by ultraviolet rays. CONSTITUTION:In a vessel 14, a monomer of transparent polymer having with high refractive index, photosensitizer and as required, cross-linking agent and a liquid mixed with solvent are filled in, and a substrate 15 is located in a liquid 11 with the state that the substrate can be moved up and down by a supporting rod 16. The substrate 15 is set on the same surface as the liquid surface of the liquid 11. Then, when ultraviolet rays 17 are irradiated, the substrate is fallen down in a constant speed at the same time, and photopolymerization is made for exposed part through a mask by ultraviolet rays and a rod body 12 is grown on the substrate. A wall 19 is given around it, a monomer 18 having a low refractive index flows, left at high temperatures to polymerize the monomer 18 and to form transparent polymer plate 29 arranged with the rod body 12 internally. Thus, the process can be simplified. |
