| 摘要 |
PURPOSE:To generate difference of a film thickness to a film only by once mask fitting and adhesion of the film by partially differentiating a thickness or a shape in the peripheral part of a mask opening. CONSTITUTION:An opening 71 is provided to the mask 63 and the peripheral part of said opening is constituted, for example, from a part with a thickness of about 150mu and a part with a thickness of about 50mu. When sputtering of an alloy is carried out by using said mask 63, a permalloy alloy thin film 21 of which the thickness is about 4mu at a part under the opening encircled by the thick mask peripheral part and about 6mu at a part under the opening encircled by the thin mask peripheral part is formed. As described above, only by once film formation using the mask, the thin film of which the thickness is partially different can be formed. |
