| 摘要 |
PURPOSE:To enable low concentration etching, by using an aqueous solution of an alkali metal compound of halogenated phenol or benzoic acid as an etching solution of an alcohol-soluble polyacid. CONSTITUTION:An alcohol-soluble polyamide layer is provided on a transparent substrate unattackable by an etching solution, on this layer a photosensitive resist layer is formed, this resist layer is exposed, and developed. This is processed with an etching solution containing one or more compounds represented by the formula in which X is OM or COOM; M is Na or K; Y is Cl or Br; and n is 1-5. This compound is embodied by sodium o-, m-, and p-chlorophenolate, potassium p-chorobenzoate, etc., and they are preferably used as a 4-30wt% aqueous solution. An aqueous solution of a lower alcohol can be used as a solvent. |
