PHOTOSENSITIVE RESIN COMPOSITION

摘要

PURPOSE:To obtain a photosensitive PVA resin composition developable with water and having superior flexibility and impact resistance after photosetting by blending a PVA polymer with water soluble polyamide and a diazo compound or an azide compound. CONSTITUTION:A polyvinyl alcohol polymer (A) is blended with 0.5-100pts.wt. water soluble polyamide (B) to 100pts.wt. of the polymer and a diazo compound or an azide compound (C). When the polymn. degree of the used PVA polymer is excessively low, the resulting resin plate tends to reduce the surface hardness, so the preferred polymn. degree is >=100. The preferred water soluble polyamide is polyamide having sulfonic acid or sulfonate bonded to a benzene ring or a naphthalene ring.