发明名称 PHOTOTYPE PROCESSING MASK
摘要 <p>A mask for use with soft X-rays or flood beams of ions comprises a thin metallic foil 12 transparent to X-rays and ions supported in tension on a frame 10 and carrying a pattern 20 opaque to the X-rays and ions. The frame, which is opaque to the X-rays and ion beams but transparent to visible light extends beyond the edge of the foil and carries markings for optically aligning the mask with a substrate this allows conventional registration techniques to be used while achieving high resolution due to the exposure with X-ray or ion beams. <IMAGE></p>
申请公布号 JPS57124352(A) 申请公布日期 1982.08.03
申请号 JP19810200261 申请日期 1981.12.14
申请人 WESTINGHOUSE ELECTRIC CORP 发明人 FUIRITSUPU DONARUDO BURAISU
分类号 G03F1/22;G03F9/00;H01L21/027 主分类号 G03F1/22
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