发明名称 PREPARATION OF TRANSPARENT CONDUCTIVE FILM
摘要 PURPOSE:To form a transparent conductive film composed of conductive molybdenum oxide and silicon oxide, by depositing molybdenum trioxide to a substrate having silicon oxide layer, and simultaneously with the deposition, reducing molybdenum trioxide to molybdenum pentoxide by the reducing action of silicon oxide. CONSTITUTION:Silicon oxide is evaporated from an evaporation source to a substrate to form a silicon oxide layer. When molybdenum trioxide is evaporated from another source to the substrate having the silicon oxide layer, molybdenum trioxide is reduced simultaneously with the deposition to electrically conductive molybdenum pentoxide by the reducing action of silicon oxide, forming a transparent conductive film composed of conductive molybdenum oxide and silicon oxide.
申请公布号 JPS57123829(A) 申请公布日期 1982.08.02
申请号 JP19810192109 申请日期 1981.11.30
申请人 DAINIPPON INSATSU KK 发明人 KURODA KOUJI;WATANABE TOSHIO
分类号 C04B41/89;C01G39/00;C03C17/245;C03C17/34;C08J7/06;C23C14/08;H01B13/00 主分类号 C04B41/89
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