HIGH RATE SPUTTERING SYSTEM AND METHOD,申请号PT19820075222-传众专利搜索

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发明名称	HIGH RATE SPUTTERING SYSTEM AND METHOD
摘要
申请公布号	PT75222(A)	申请公布日期	1982.08.01
申请号	PT19820075222	申请日期	1982.07.09
申请人	AMPEX CORPORATION	发明人
分类号	C23C14/36;C23C14/34;C23C14/35;(IPC1-7):H01F/	主分类号	C23C14/36
代理机构		代理人
主权项
地址

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