| 摘要 |
PURPOSE:To eliminate the unsharpness of the periphery of an electron beam of an electron beam size variable exposure apparatus by comparing a figure to be drawn with the maximum allowable size of the beam, comparing the area of the figure with the predetermined value, and dividing the figure with the two values. CONSTITUTION:An exposure apparatus is composed of a height direction division control circuit 1, a width direction division control circuit 2, registers 3-9, a digital multiplier 10, digital comparators 11-15, a comparator 16 with a register, a subtractor 17, a digital comparator 18, selectors 19, 20 with registers, and a controller 21. Thus, the maximum allowable width W0 and the height H0 are respectively applied to the registers 3, 6, and the figure width W1 and height H1 to be divided are respectively set in the registers 5, 8. The value of H1XW1=C is set in the register 9, and the figure width W and height H of the entire figure to be divided are respectively set in the registers 4, 7. In this manner, the dividing mode is determined, and a figure is drawn in accordance with this. |
