| 摘要 |
PURPOSE:To alleviate the steps in designing with an exposure apparatus by drawing a pattern with a data which designates a main deflection amount as a drawing data, a data which designates a drawing pattern in a sub deflection range and further additionally a data which designates a drawing pattern group repeatedly while superposing arbitrary sub deflection ranges. CONSTITUTION:A drawing data 11 is applied to a data translator 12, and selected data is supplied to a drawing controller 13 and main and sub deflection registers 14, 15. Subsequently, the output of the controller 13 is supplied to the registers 14, 15, and is also applied through a blanker 16 to an electro-optical mirror 19. Further, the output from the register 14 is applied through a main deflector DA converter 17 to a main deflector 20, and the output from the register 15 is supplied through a sub deflector DA converter 18 to a sub deflector 21. In this structure, the data 11 is composed of 3 types A, B, C. The A employs a data which sets the main deflection amount, the B employs B-1, B-2, wherein the B-1 designates a pattern in the sub deflection range, and the B-2 designates the indirect drawing. Further, C is similar to the B-1, but is used for the repeated data. |
