DRAWING DATA PROCESSING SYSTEM FOR ELECTRON BEAM EXPOSURE APPARATUS

摘要

PURPOSE:To enhance the productivity of an exposure apparatus by feeding only minimum data necessary to draw to one group of patterns having the prescribed regularity to drawing pattern data, thereby reducing the quantity of the data to be transferred to a buffer memory. CONSTITUTION:Data 11 from a buffer memory forming an exposure apparatus are fed to a controller shown below. In other words, the data 11 are applied to a judging circuit 12. The output from the judging circuit 12 is in turn applied to the first multiplexer 15. The signal from the multiplexer 15 is in turn applied through a plurality of registers 161-16n to a single pattern data generator 17. An output separately selected from the circuit 12 is connected to the output terminal of a generator 17. The signal from the generator 17 is applied through the second multiplexer 18 to a plurality of registers 191-19n. A drawing operation controller 20 is operated by the outputs from the registers. With the structure thus constructed, the circuit 12 discriminates the pattern group having the prescribed regularity. The necessary data are applied through signal wires 13 to the first multiplexer 15, and the other data are applied through signal wires 14 to the second multiplexer 18 of the rear stage.