| 摘要 |
The invention relates to resins used for manufacturing or reproducing masks in electronics. The photomasking composition corresponds to the general formula: <IMAGE> in which R1, R1', R1'', R2, R2', R2'' designate alkyl radicals whose principal chain contains from 1 to 10 carbon atoms, the symbols F, Cl and Br which designate the fluorine, chlorine and the bromine bearing indices a, b, c, a', b', and c' representing the number of these atoms which are zero or positive whole numbers, such as m, n, p. |
