发明名称 DETECTION OF MARK AT ELECTRON BEAM EXPOSURE
摘要 PURPOSE:To contrive to shorten effectively the scanning distance and to shorten scanning time of an electron beam by a method wherein only the extremely nearby part of the edge part of a mark is scanned by the electron beam. CONSTITUTION:Aiming at effective shortening of the scanning distance of the beam, a means to scan only the neighborhood (the solid line parts of loci 8) of the edge parts 7 of the mark to constitute the most important informations to detect the pattern of the mark is provided. Because scanning of the beam is performed by generating a beam scanning signal through a D/A converter, interlaced scanning can be performed easily by changing digital signals to be applied to the D/A converter. By this method, beam scanning of two places for about 5mum at the neighborhood of the mark is enough for one scanning, beam scanning time is shortened to 1/6 of the customary method, and even when the other treating time is made to be contained, the time required can be shortened to 1/2 on the whole as compared with the customary method.
申请公布号 JPS57121228(A) 申请公布日期 1982.07.28
申请号 JP19810007243 申请日期 1981.01.22
申请人 NIPPON DENSHIN DENWA KOSHA;HITACHI SEISAKUSHO KK 发明人 MATSUDA KOREHITO;OOKUBO TSUNEO;TAKAMOTO KIICHI;OZASA SUSUMU;YOKOUCHI HISATAKE
分类号 H01L21/027;H01J37/304;(IPC1-7):01L21/30 主分类号 H01L21/027
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