发明名称 METHOD AND APPARATUS FOR FORMING THIN POLYMER FILM
摘要 PURPOSE:To enable the use of a polymer with a low heat diffusion rate and to enhance the endurance of a thin film applied produce by enabling the cooling of a target when a thin film is formed on the surface of an object by sputtering. CONSTITUTION:The titled apparatus is composed of a mechanism transferring an object 3 on which a thin polymer film is formed in a vacuum vessel 1, a flexible electret, a mechanism cooling the electret, and a mechanism 9 generating magnetism. Said electret is used as a target 4, and the adhesion to a cooling jacket 6 is increased by static electricity or the like to efficiently cool a polymer molding. Thus, a thin film applied product with superior endurance is obtd. efficiently.
申请公布号 JPS57120668(A) 申请公布日期 1982.07.27
申请号 JP19810005262 申请日期 1981.01.16
申请人 MATSUSHITA DENKI SANGYO KK 发明人 SHINOHARA KOUICHI
分类号 C23C14/12;C23C14/34;C23C14/56 主分类号 C23C14/12
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