| 摘要 |
PURPOSE:To ensure the effective washing of a photomask, by combining two or more washing methods and use them simultaneously. CONSTITUTION:For instance, an ultrasonic wave is irradiated to the acetone 2 in a container 1, while a photomask 4 is dipped into the acetone 2 (ultrasonic wave washing). At the same time, the mask 4 is washed with a brush 3 (mechanical washing). Then a jet spray 5 is applied to the mask 4 (jet spray washing), and then the mask 4 is dried by a drying lamp 6. In other words, such known washing methods as the mechanical washing, chemical washing, ultrasonic wave washing, jet spray washing, etc. are properly combined to increase the washing effect. |
