发明名称 METHOD AND DEVICE FOR CORRECTING WHITE SPOT DEFECT OF PHOTOMASK
摘要 PURPOSE:To correct white spot defects precisely while observing the change in the properties of a correcting material which deposits metal of low resistance when irradiated with laser light by the irradiation of laser by means of reference light by using said material. CONSTITUTION:A metallic chelate polymer of ethylene imine contg. Cr, Cu, Pd, etc. as metal or a metal complex soln. prepd. by adding silver nitrate, cobalt nitrate or copper nitrate to an org. solvent of which light shielding characteristic is improved when irradiated with laser light is used as a correcting material, and is coated on a defective part 4 and around this. Next, light of <=1.3mum wavelength is irradiated to cause a change in its properties, and the reflected images of the observation light from a photomask 1 and a correcting material 3 or reference light are discriminated. When the difference in the contrast within said reflection attains a constant value or below, the irradiation is stopped right after this or after a constant time.
申请公布号 JPS57118246(A) 申请公布日期 1982.07.23
申请号 JP19810003044 申请日期 1981.01.14
申请人 HITACHI SEISAKUSHO KK 发明人 MIZUKOSHI KATSUROU;HONGOU MIKIO;OKUNAKA MASAAKI;MIYAUCHI TAKESHI;MITANI MASAO
分类号 G03F1/00;G03F1/72;H01L21/027;H05K3/10;H05K3/22 主分类号 G03F1/00
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