| 摘要 |
A presensitized plate adapted for use in lithography comprising a support member with a metal surface, e.g. aluminum metal, and overlying layer containing a diazo compound. In accordance with this invention, the relative exposure sensitivity of the diazo compound is improved by pretreatment to accelerate its reactivity in the presence of actinic light. Methods of pretreatment described are preheating the diazo compound to a temperature above about 35 DEG C up to about 120 DEG C, treatment with ultraviolet light, treatment with a laser beam, treatment with an electron beam source and treatment with deep ultraviolet energy. |
